Quickly evaluate and analyze various film characteristics, including thickness, composition, and degree of crystallization, to improve cell quality management and yield.

HORIBA’s products support the formation of ideal films for solar cells, by measuring the thickness and degree of crystallization in each film layer, and selecting the optimum deposition conditions. This enables effective cell quality management, and promotes more stable conversion efficiency. The FF-2000 Series is suitable for non-destructive analysis of full-sized substrates.


LEM-CT-670-G50

实时的干涉测量设备,提供蚀刻/镀膜制程中高精度的膜厚及蚀刻沟深度检测

Real Time Interferometric Process Monitor DIGILEM-CPM-Xe/Halogen

实时的干涉测量设备,提供蚀刻/镀膜制程中高精度的膜厚及蚀刻沟深度检测

EV-140C

这是一套分析放射性发光的终点监测设备,专为以等离子技术为基础的半导体薄膜制程进行终点检定或等离子条件的监控而研制。最新的数学模型技术赋予它通过捕获微弱信号的变化进行终点检定的能力。在放射性发光中捕获微弱变化的能力显著地提高了灵敏度。对于抗干扰性的改善确保了本设备在复杂环境下持续不停的生产线上获得高稳定的运行。...

产品:

UVISEL VIS: 210-880 nm

UVISEL FUV: 190-880 nm

UVISEL NIR: 245-2100 nm

UVISEL ER: 190-2100 nm

UVISEL VUV: 142-880 nm

测量薄膜厚度和光学常数。用于研究和工艺发展.

AutoSE

Auto SE——让您的例行测量工作不再枯燥!

GD-Profiler 2™提供了快速、同时分析所有感兴趣的元素,包括氮、氧、氢和氯。是薄膜描述和工艺研究的理想工具。