Comprehensive Particle Detection for Semiconductor and FPD Manufacturing Processes

HORIBA's PD Series is focused toward providing the particle detection support required for next-generation semiconductor and FPD manufacturing processes. The PD Series' great versatility, based on its outstanding detection capabilities, makes it ideal for handling mask production as well as exposure and wafer manufacturing processes.
Complementing HORIBA's HAZE-resistant monitors, the PD line-up offers models specifically for leading-edge masking processes plus compact, low-cost models. In addition, the range has now been enhanced with the introduction of new particle removal systems.

Particle Detection

PR-PD2HR Particle detection system

Achieves dramatic cost reductions in advanced mask inspections

HORIBA's PR-PD2 Particle Detection System

High sensitive particle detection down to 0.35┬Ám.

Compact Reticle/Mask Particle Detection System PR-PD3

Low running costs thanks to a compact design, plus remarkable versatility

PR-PD5 Particle detection system

For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.

Reticle/Mask Particle Remover RP-1

Automatically removes particles by blow and vacuum suction

Cleanroom Gas Monitoring