FPD Process
DI Water Analysis (Wet Process)
Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).
Material Analysis (Particulates Analysis & Defect Analysis)
Single point analysis and automated hyperspectral imaging.
Dual vacuum modes.
Spot sizes from 1.2 mm to 10 µm.
Le GD-Profiler 2™ permet l’analyse simultanée de tous les éléments y compris les gaz (azote, oxygène, chlore, hydrogène). Il est l’outil idéal pour la caractérisation des surfaces, des couches minces, des dépôts et le suivi de productions.
High spectral resolution analytical Raman microscope for ultimate performance and flexibility; includes UV Raman configuration, full automation and wide range of accessories.
Chemical Analysis (Wet Process)
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
Ideal for ozone fluid density control in semiconductor production processes
This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.
High precision liquid mass flow controller using the sensor with a unique cooling method. Can control from micro-liter to ultra low flow rate.
Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.
Measurement range: 0 -10%
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm
Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm
Compact resistivity meter for versatile porpose. Measurement range: 0 - 100.0 MΩ・cm
TMAH monitor can measure the wide range from 0 - 10 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.
Carbon sensor compact conductivity meter for low concentration. Measurement range: 0 - 9999 μS/cm (Sensor FS-07F), 0 - 999 μS/cm (Sensor ESH-01-L-GC5), 0 - 9999 μS/cm (Sensor ESH-1-L-GC9).
Wide range, carbon sensor conductivity meter for high concentration. Measurement rage: 0 - 1000 mS/cm
Gas Control/Analysis (Dry Process)
For various industries. Wide range of communication, Digital/Analog, DeviceNet™, CC-Link®, PROFIBUS™ and EtherCAT®. Wide control range from 10 SCCM to 1000 SLM. All-metal.
The UR series automatic pressure regulators are electronic regulators with high-precision pressure sensors and ...
Best-selling, compact baking system suitable for a range of liquid source delivery applications. Easy maintenance.
The compact vaporization system does not require carrier gas, it can be used with either a liquid or gas flow meter, allowing for easy integration for direct liquid injection.
Automatic liquid refill system delivers chemicals directly to baking or direct liquid injection systems. Safe, efficient, and continuous supply of liquid sources.
The best-selling digital mass flow controller offering multi range/multi gas solutions. High accuracy, fast response, and compact size. All metal.
Vaporize liquid source stably by the gas-liquid mixture vaporization method. Can be used for low temperature and large flow production.
Process Monitoring (Dry Process)
Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.
Plasma Process Control
Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.
Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.Interference occurs when monochromatic light hits the sample surface, resulting in...
Emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.
Drain Water Analysis
Suitable pH meter for monitoring processes and quality inspections in various industries.
Thin Film Analysis
Produits : UVISEL VIS : 210-880 nm | UVISEL FUV : 190-880 nm | UVISEL NIR : 245-2100 nm | UVISEL ER : 190-2100 nm |
Idéal pour la caractérisation des couches minces en recherche et développement.