FPD Process

DI Water Analysis (Wet Process)

Highly Sensitive Silica Monitor SLIA-300

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

Dissolved Oxygen Monitor SD-300

Ever-increasing semiconductor circuit densities require higher-quality ultra-pure water for cleaning wafers.

Minute DO (dissolved oxygen) in ultra-pure water oxygenates the wafer surfaces. To ensure high-quality ultra-pure water, DO levels must be strictly controlled. Horiba's SD-300 DO Monitor is the solution.

Created utilizing Horiba's semiconductor technologies, it provides effective high-quality, pure-water management. The SD-300 DO Monitor is lightweight and portable. It can be carried anywhere, enabling high-precision measurement of DO levels in ultra-pure water in the semiconductor industry.

Material Analysis (Particulates Analysis & Defect Analysis)


Single point analysis and automated hyperspectral imaging.

Dual vacuum modes.

Spot sizes from 1.2 mm to 10 µm.


Le GD-Profiler 2™ permet l’analyse simultanée de tous les éléments y compris les gaz (azote, oxygène, chlore, hydrogène). Il est l’outil idéal pour la caractérisation des surfaces, des couches minces, des dépôts et le suivi de productions.

LabRAM HR Evolution Raman Microscope

High spectral resolution analytical Raman microscope for ultimate performance and flexibility; includes UV Raman configuration, full automation and wide range of accessories.

Chemical Analysis (Wet Process)

Fiber Optic Type Chemical Concentration Monitor CS-100F1 Series

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

Standard Clean 1 (SC-1) chemical concentration monitor image

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

SPM Monitor image

High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices

BHF monitor image

The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.

CS-153N HF/HNO3 Monitor

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

FPM Monitor / CS-153

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

CS Series Monitors

High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices

Hydrofluoric Acid Monitor CM-200A/210A

Ideal for hydrofluoric acid monitoring in semiconductor manufacturing

In-line type Dissolved Ozone Monitor OZ-96i

Ideal for ozone fluid density control in semiconductor production processes


Dissolved Ozone Monitor OZ-96

This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.


Digital Liquid Mass Flow Meters/Controllers LF-F/LV-F series

High precision liquid mass flow controller using the sensor with a unique cooling method. Can control from micro-liter to ultra low flow rate.

HF/HCl Concentration Monitor HF-960H

Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.

Measurement range: 0 -10%

Low Concentration HF/HCl/NH3 Monitor HF-960M

High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.

Carbon Sensor Resistivity Meter HE-960R-GC(W)

Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm

2-channel Carbon Sensor Resistivity Meter HE-960RW-GC(W)

Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm

Industrial Resistivity Meter HE-480R

Compact resistivity meter for versatile porpose. Measurement range: 0 - 100.0 MΩ・cm

Wide range TMAH Concentration Monitor HE-960H-TM

TMAH monitor can measure the wide range from 0 - 10 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.

Carbon Sensor Conductivity Meter (Low concentration type) HE-480C-GC

Carbon sensor compact conductivity meter for low concentration. Measurement range: 0 - 9999 μS/cm (Sensor FS-07F), 0 - 999 μS/cm (Sensor ESH-01-L-GC5), 0 - 9999 μS/cm (Sensor ESH-1-L-GC9).

Carbon Sensor Conductivity Meter (High concentration type) HE-960HC

Wide range, carbon sensor conductivity meter for high concentration. Measurement rage: 0 - 1000 mS/cm

Gas Control/Analysis (Dry Process)

Digital Mass Flow Controller SEC-N100 Series

For various industries. Wide range of communication, Digital/Analog, DeviceNet™, CC-Link®, PROFIBUS™ and EtherCAT®. Wide control range from 10 SCCM to 1000 SLM. All-metal.

Automatic pressure regulators

The UR series automatic pressure regulators are electronic regulators with high-precision pressure sensors and ...

Compact Baking System LSC Series

Best-selling, compact baking system suitable for a range of liquid source delivery applications. Easy maintenance.

Direct Injection System VC Series

The compact vaporization system does not require carrier gas, it can be used with either a liquid or gas flow meter, allowing for easy integration for direct liquid injection.

Liquid Auto Refill System LU Series

Automatic liquid refill system delivers chemicals directly to baking or direct liquid injection systems. Safe, efficient, and continuous supply of liquid sources.

Multi Range/Multi Gas Digital Mass Flow Controller SEC-Z500X Series

The best-selling digital mass flow controller offering multi range/multi gas solutions. High accuracy, fast response, and compact size. All metal.

Mixed Injection System Liquid Vaporizer MI-1000/MV-1000 Series

Vaporize liquid source stably by the gas-liquid mixture vaporization method. Can be used for low temperature and large flow production.

Process Monitoring (Dry Process)

Compact Process Gas Monitor MICROPOLE System

Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.

Plasma Process Control

Real Time Interferometric Process Monitor LEM-CT-670-G50

Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.

Real Time Interferometric Process Monitor DIGILEM-CPM-Xe/Halogen

Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.Interference occurs when monochromatic light hits the sample surface, resulting in...

Optical Emission Spectroscopy Etching End-point Monitor EV-140C

Emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.

Drain Water Analysis

HP-480 the industrial ph meter

Suitable pH meter for monitoring processes and quality inspections in various industries.

Thin Film Analysis


Produits : UVISEL VIS : 210-880 nm | UVISEL FUV : 190-880 nm | UVISEL NIR : 245-2100 nm | UVISEL ER : 190-2100 nm |

Idéal pour la caractérisation des couches minces en recherche et développement.