Chemical Analysis (Wet Process) Array Process
Fiber Optic Type Chemical Concentration Monitor CS-100F1 Series

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

Standard Clean 1 (SC-1) chemical concentration monitor image

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

SPM Monitor image

High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices

BHF monitor image

The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.

CS-153N HF/HNO3 Monitor

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

FPM Monitor / CS-153

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

CS Series Monitors

High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices

Hydrofluoric Acid Monitor CM-200A/210A

Ideal for hydrofluoric acid monitoring in semiconductor manufacturing

In-line type Dissolved Ozone Monitor OZ-96i

Ideal for ozone fluid density control in semiconductor production processes

 

Dissolved Ozone Monitor OZ-96

This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

 

Digital Liquid Mass Flow Meters/Controllers LF-F/LV-F series

High precision liquid mass flow controller using the sensor with a unique cooling method. Can control from micro-liter to ultra low flow rate.

HF/HCl Concentration Monitor HF-960H

Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.

Measurement range: 0 -10%

Low Concentration HF/HCl/NH3 Monitor HF-960M

High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.

Carbon Sensor Resistivity Meter HE-960R-GC(W)

Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm

2-channel Carbon Sensor Resistivity Meter HE-960RW-GC(W)

Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm

Industrial Resistivity Meter HE-480R

Compact resistivity meter for versatile porpose. Measurement range: 0 - 100.0 MΩ・cm

Wide range TMAH Concentration Monitor HE-960H-TM

TMAH monitor can measure the wide range from 0 - 10 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.

Carbon Sensor Conductivity Meter (Low concentration type) HE-480C-GC

Carbon sensor compact conductivity meter for low concentration. Measurement range: 0 - 9999 μS/cm (Sensor FS-07F), 0 - 999 μS/cm (Sensor ESH-01-L-GC5), 0 - 9999 μS/cm (Sensor ESH-1-L-GC9).

Carbon Sensor Conductivity Meter (High concentration type) HE-960HC

Wide range, carbon sensor conductivity meter for high concentration. Measurement rage: 0 - 1000 mS/cm