Chemical Concentration Monitor CS-700

Enables highly stable, precise measurement of multi components chemical solution utilizing HORIBA's spectroscopic measurement technology

Micro Volume pH Monitor UP-100

Visualization of chemical parameter changes using Inline pH monitor

Fiber Optic Type Chemical Concentration Monitor CS-600F

Enables improved cleaning process efficiency with "high temperature chemical measurement", "stable operation" and "compact body size" to meet leading-edge process requirements.

Fiber Optic Type Chemical Concentration Monitor CS-100F1 Series

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

Standard Clean 1 (SC-1) chemical concentration monitor image

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

Dissolved Oxygen Meter in Low Concentration HF HD-960L

High stability measurement dissolved oxygen concentration in low concentration HF. Automatically switches between three measurement ranges from μg/L to mg/L. Measurement range : 0 - 20.00 mg/L.

Dissolved Ozone Monitor HZ-960

High precision, wide-range dissolved ozone monitor. In-line type sensor.

Low Concentration HF/HCl/NH3 Monitor HF-960M

High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.

In-line Sensor & Auto Range Switching Model HF Concentration Monitor HF-960EM

Wide range HF concentration monitor from low to undiluted liquid. High precision measurement with auto range switching function. All PFA sensors.

CS Series Monitors

High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices

SPM Monitor image

High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices

FPM Monitor / CS-153

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

CS-153N HF/HNO3 Monitor

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

BHF monitor image

The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.

Appearance of CS-152, SC-2 monitor

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices

HF/HCl Concentration Monitor HF-960H

Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.

Measurement range: 0 -10%

Wide range TMAH Concentration Monitor HE-960H-TM

TMAH monitor can measure the wide range from 0 - 10 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.

High Precision TMAH Concentration Monitor HE-960H-TM-S

High precision TMAH monitor can measure the range from 0 - 3 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.

Carbon Sensor Conductivity Meter (High concentration type) HE-960HC

Wide range, carbon sensor conductivity meter for high concentration. Measurement rage: 0 - 1000 mS/cm

Carbon Sensor Resistivity Meter HE-960R-GC(W)

Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm

2-channel Carbon Sensor Resistivity Meter HE-960RW-GC(W)

Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm

HP-480 the industrial ph meter

Suitable pH meter for monitoring processes and quality inspections in various industries.