Chemical Concentration Monitoring

HORIBA provide a wide range of inline and offline concentration monitors for the different high and low concentration wet etching processes for Low-k, Al, Oxide/Nitride, Poly Silicon etc. In addition to monitors for wet etching a wide range of monitors for the different cleaning steps, for example removal of particles, resist, metallic layer, organic layers, oxides, polymers etc are also available.
To assist selection of the correct monitor for you chemistry please view our Chemical Solution Monitor *1 brochure.
*1 This will open in a new window

Fiber Optic Type Chemical Concentration Monitor CS-100F1 Series

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

Standard Clean 1 (SC-1) chemical concentration monitor image

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

BHF monitor image

The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.

CS Series Monitors

High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices

SPM Monitor image

High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices

Appearance of CS-152, SC-2 monitor

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices

FPM Monitor / CS-153

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

CS-153N HF/HNO3 Monitor

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

HF/HCl Concentration Monitor HF-960H

Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.

Measurement range: 0 -10%