This web seminar will discuss the use of radiofrequency glow discharge coupled to optical emission spectrometry (RF-GD-OES) for depth profile analysis of conductive and nonconductive coatings, films, layers, and substrates, focusing on semiconductor and photovoltaic applications. Examples will show how RF-GD-OES has been used successfully to solve process deviation problems and to identify the origin of defects such as stains, color changes, delaminations, and corrosion. The seminar will also focus on a comparison of RF-GD-OES with SIMS, showing how these two techniques are complementary.

Key Learning Objectives

• Discover a new technique for depth profile analysis
• Compare this technique to SIMS
• Problem solving for semiconductor and photovoltaic applications

Who Should Attend

• Any person already using SIMS
• Any person doing single or multilayer coating on a substrate
• Any person wishing to build a new “surface analysis” lab
• Any commercial testing lab wishing to expand their application to surface analysis