Dry Process Monitoring
Semiconductor devices, Flat Panel Displays and Photo Voltaic cells remain at the cutting edge of technology. HORIBA has many years experience in this high-tech field. HORIBA instrumentation is used to measure the chamber conditions for example to monitor plasma to detect the end point in an etching process. The instrumentation is also widely used in gas analysis in a variety of applications from inline to offline and from high concentration to parts per trillion levels.
Suitable for semiconductor and FPD processes. The compact design makes it easy to maneuver, allowing it to be used for a wide range of applications. New line of single and dual cell gas analyzers
The IR-150 is designed for real time inline concentration measurement using a Non-dispersive infrared (NDIR) method
Integrated management with an in-situ real time monitor "DIGI Series" for next-generation thin-film processes
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