Applications

2D Materials

The industrialization of 2D materials and their emergence in electronic devices will not only depend on the uniformity assessment of their deposition on large wafers but also on overcoming the presence of defects which reduces the size of high-quality crystals, and on preserving quality through the processing steps.

Raman/Photoluminescence characterization of Graphene and 2D semiconductors

Application: CMOS, electrodes, barriers

Materials: Graphene, Transition Metal Dichalcogenides, Hexagonal Boron Nitride (h-BN)

  • Measurement of layer thicknesses
  • Uniformity assessment: indication of graphene crystal quality and strain fluctuation; assessment of charge carrier concentration, stoichiometry and bandgap
  • Defect inspection: indication of defect density (intrinsic); visualization and identification of contaminants

Graphene Raman image of a 4" wafer

High resolution Raman image on defects

D/G distribution peak analysis

Related Products

LabRAM Odyssey Semiconductor
LabRAM Odyssey Semiconductor

Photoluminescence and Raman Wafer Imaging

제품 문의

HORIBA제품의 자세한 정보를 원하시면, 아래의 양식에 내용을 입력을 부탁드립니다.

* 는 필수입력항목입니다.

Corporate