Reticle/Mask Particle Remover RP-1

개요

Automatically removes particles by blow and vacuum suction
Automatically removes particles from the reticle/mask by air (or N2) blow and vacuum suction.  Removal of particles by routine use before lithography process extends the replacement cycle of the pellicle and cleaning cycle of the mask, thereby contributing to a reduction in running costs. When particles on the glass surface is removed
(Data of 20 µm borosilicate bead removal rate)
Data of 20 µm borosilicate bead removal rate Features


제조원 HORIBA

사양

Applicable case

Nikon/Canon/SMIF POD/HORIBA

Throughput

Simultaneously blows the glass and pellicle surfaces to remove particles approximately for 1 min.

Dimensions

1190(D) x 1150(W) x 1520(H)mm