See us at
- SPIE Photonics West, February 16-18, San Francisco, CA
- American Physical Society (APS), March 14-18, Baltimore, MD
- Materials Research Society (MRS) Spring, March 28-April 1, Phoenix, AZ
- 2016 E-MRS Spring Meeting, May 2-6, 2016, Lille, France
- Society of Vacuum Coaters (SVC), May 9-13, Indianapolis, IN
- IEEE-PVSC, June 5-10, Portland, OR
- 7th International Conference on Spectroscopic Ellipsometry (ICSE-7), June 6-10, 2016, Berlin, Germany
- Semicon West, July 12-14, San Francisco, CA
- SPIE Optics and Photonics, August 30-September 1, San Diego, CA
- American Vacuum Society (AVS), November 6-11, Nashville, TN
- Materials Research Society (MRS) Fall, November 27-December 2, Boston, MA
Spectroscopic Ellipsometry Solutions
Spectroscopic ellipsometry is a surface sensitive, non-destructive, non-intrusive optical technique widely used to determine film thickness and optical constants (n, k). Spectroscopic ellipsometry is ideal for a wide range of applications from fields such as semiconductors, photovoltaics, optoelectronics, optical and functional coatings, surface chemistry, and biotechnology. For more information on thin film characterization by spectroscopic ellipsometry, please visit our Ellipsometry Academy, which will provide a tutorial, webinars and videos, and some FAQ’s.
For over 20 years, HORIBA Scientific has provided a wide range of spectroscopic ellipsometers, working together with the powerful & intuitive DeltaPsi 2 software, and accessories designed to meet the needs of all users. With a wavelength range from VUV to NIR and the capability to perform ex-situ, in-situ, in-line, and large area measurements, HORIBA Scientific’s spectroscopic ellipsometers provide the most sensitive ellipsometric measurements because of the use of stationary phase modulation technologies and the extensive experience in optics from JobinYvon.