Chemical Concentration Monitors
HORIBA’s chemical concentration monitors measure the concentration of various chemical materials i.e. SC-1, SC-2, SPM, HF etc. in real-time. This monitor can be used in the cleaning and etching processes within semiconductor manufacturing. Our chemical concentration monitors can measure up to eight components of multi components chemicals (depending on product model). We also have monitors to measure single component chemicals and ensure we can match your manufacturing process and facility. All our models are highly accuracy and stability. Choose from the bellow line-up the best chemical concentration monitor that meets your needs.
Chemical Concentration Monitor
Enables highly stable, precise measurement of multi components chemical solution utilizing HORIBA's spectroscopic measurement technology
Enables improved cleaning process efficiency with "high temperature chemical measurement", "stable operation" and "compact body size" to meet leading-edge process requirements.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
Chemicals soulution concentration monitor has a compact profile, support for multi-bath, single-bath, and dingle-wafer cleaning systems
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.
Measurement range: 0 -10%
Wide range HF concentration monitor from low to undiluted liquid. High precision measurement with auto range switching function. All PFA sensors.
Provides continuous and precise measurement of hydrofluoric concentrations in diluted sulfuric acid and hydrogen peroxide at the ppm level.
Citric Acid Monitor
High precision TMAH monitor can measure the range from 0 - 3 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.
TMAH monitor can measure the wide range from 0 - 10 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.
Dissolved Ozone Monitor
Dissolved Oxygen Monitor
High stability measurement dissolved oxygen concentration in low concentration HF. Automatically switches between three measurement ranges from μg/L to mg/L. Measurement range : 0 - 20.00 mg/L.
Chemical Resistivity Meter
Improved maintenance of equipment such as chillers with solvent management by monitoring deterioration of solvents
Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm
Resostivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm
Compact resistivity meter for versatile porpose. Measurement range: 0 - 100.0 MΩ・cm
Carbon sensor compact conductivity meter for low concentration. Measurement range: 0 - 9999 μS/cm (Sensor FS-07F), 0 - 999 μS/cm (Sensor ESH-01-L-GC5), 0 - 9999 μS/cm (Sensor ESH-1-L-GC9).
Wide range, carbon sensor conductivity meter for high concentration. Measurement rage: 0 - 1000 mS/cm
Carbon sensor conductivity meter for low concentration. Measurement range: 0 - 1000 μS/cm, 0 - 10000 μS/cm (Sensor FS-07F)