Plasma Emission Controller/Regulator

HORIBA‚Äôs plasma emission controller/regulator provide can excellent plasma control over reactive sputtering (PVD). The superb feedback control of the reactive gas flow in a reactive sputtering process helps enhance product quality and achieve greater productivity by monitoring the plasma generated by sputtering or the voltage of the power supply for the sputtering process. 

Achieve faster deposition by controlling the transition region and optimized distribution with this Plasma Emission controller/regulator.

Plasma Emission Controller RU-1000

Excellent Plasma Control over Reactive Sputtering.

The superb feedback control of the reactive gas flow in a reactive sputtering process helps you enhance product quality and achieve greater productivity by monitoring the plasma generated by sputtering or the voltage of the power supply for the sputtering process.