Plasma Process Monitor

For manufacturing processes where plasma is used, HORIBA offers the in-situ real time monitors. We have two suitable products for the plasma process. The Optical Emission Spectroscopy Etching End-point Monitor can detect end-point of plasma etching. The Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching and coating process.

Optical Emission Spectroscopy Etching End-point Monitor

Optical Emission Spectroscopy Etching End-point Monitor EV-140C

Emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.

Real Time Interferometric Process Monitor

Real Time Interferometric Process Monitor LEM-CT-670-G50

Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.