Vacuum / Gas Monitor

We have various types of Vacuum and Gas Monitors and Analysers for use with residual gas analyzation. In addition to the Capacitance Manometer which is compact, all metal and has a self-temperature adjustment function, we also offer the ultra-compact Gas Monitor which has nine quadrupoles in arrays for residual gas analysing. These are optimal for process control or analysis in a vacuum chamber.

Our Vapor Concentration Monitor (IR-300) is reliable, high performing and non-dispersive infrered Absorptiometry (NDIR). Our Capacitance Manometer has a capacitance diaphragm gage. 


Compact Process Gas Monitor

Compact Process Gas Monitor MICROPOLE System

Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.

Capacitance Manometer

Capacitance Manometer VG Series

Compact all metal capacitance manometer

Gas Concentration Monitor

Gas Monitor IR-400

High senility in-line gas monitor of SiF4 and CF4 for chamber cleaning end point monitoring in deposition process. Reduce clean time and gas usage by real-time monitoring.

Vapor Concentration Monitor IR-300

In-line compact vapor concentration monitor, enables MOCVD precursor delivery to be stable.


With the evolution of increasingly fine film deposition processes in semiconductor manufacturing, a frowing emphasis has been placed on maintaning a clean environment within the chamber after wafer film deposition as a means of increasing productivity.