Reticle/Mask Particle Remover RP-1
Overview
Automatically removes particles by blow and vacuum suction
Automatically removes particles from the reticle/mask by air (or N2) blow and vacuum suction. Removal of particles by routine use before lithography process extends the replacement cycle of the pellicle and cleaning cycle of the mask, thereby contributing to a reduction in running costs.
When particles on the glass surface is removed
(Data of 20 µm borosilicate bead removal rate)
Features
Useful for the following cases
- Reduces operator routine work and prevents human damage to pellicles.
- Eliminates human handling and prevents electrostatic discharge damage.
- Removal of particles before and after storage in the reticle stocker extends the duration of the mask life.
- In combination with the Reticle/Mask Particle Detection System PR-PD Series, the state of the reticle/mask after removal of particles can be confirmed.
Manufactured by HORIBA
Specifications
Applicable case | Nikon/Canon/SMIF POD/HORIBA |
|---|---|
Throughput | Simultaneously blows the glass and pellicle surfaces to remove particles approximately for 1 min. |
Dimensions | 1190(D) x 1150(W) x 1520(H)mm |