Application
Semiconductor & FPD
Manufacturing Process Control
High throughput compact rugged spectrograph, suitable for dedicated Raman analysis and portable applications. Available rack mounted for industrial settings.
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
High precision flow rate measurement with one-touch operation.
High precision flow rate measurement with one-touch operation.
The digital mass flow controller for high-temperature environment, from 15 ℃ to 120 ℃. Digital/Analog communication.
A best-seller mass flow controller for high temperature environments
A best-seller mass flow controller for high temperature environments
A best-seller mass flow meter for high temperature environments
Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing