Application
Chemical Solutions Analysis
Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm
This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
High throughput compact rugged spectrograph, suitable for dedicated Raman analysis and portable applications. Available rack mounted for industrial settings.
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
Ideal for ozone fluid density control in semiconductor production processes