Electric & Electronic Machinery, Instrument

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

GA-370 : Continuous and ultrahigh-sensitivity measurement of trace impurities (CO, CO₂and CH₄) in high-purity gas.

The IR-150 is designed for real time inline concentration measurement using a Non-dispersive infrared (NDIR) method

The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.

The HORIBA Scientific GD-Profiler HR™ gives the optimum in terms of resolution and number of elements to solve analytical problems even in the most complex matrices.

The Gemini 180 is a fully automated, double additive grating scanning monochromator. The incorporation of toroidal optics provides for optimum throughput and spectral resolution. It is ideal for applications that require low stray light and illumination including Transmission, Absorbance, Reflectance, and Fluorescence.

The use of a concave aberration corrected holographic grating simplifies the optical configuration of the H-20 monochromator in comparison to conventional monochromators.

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).