Industry
Plasma Emission Controller RU-1000
Overview
The optical technology developed by HORIBA and the gas control technology offered by HORIBA STEC have joined forces to make further advances in plasma control technology.
- Faster deposition by controlling the transition region
- Optimized distribution in a large-area, high-capacity chamber
- Plasma stabilization in a long sputtering process (stable deposition)
- Mixture optimization of compounds for reactive sputtering
The RU-1000 plasma emission controller achieves excellent spatial distribution of deposition on substrates with large surface areas.
Reactive sputtering is performed for film deposition on films and glass substrates used for touch panels. This method is employed to form a deposited film by chemical reactions between sputtered particles and oxygen, nitrogen or the like in a vacuum chamber. Unfortunately, practical application has been deemed too difficult considering the slow pace of film deposition when a constant volume of reactive gas is supplied. However, the film deposition dramatically accelerates, albeit unstably, in a transition region between the reactive mode and metallic mode, the latter of which results in faster film deposition. Such a transition region can be maintained by controlling the reactive gas by adjusting the intensity of plasma emission and the power supply.
The RU-1000 plasma emission controller accelerates film deposition to a pace comparable to that in metallic mode and achieves excellent deposition distribution on substrates with large surface areas. This unit captures signals representing the plasma condition transmitted from the PMT unit and plasma power supply and employs an algorithm written by HORIBA STEC to control a highly responsive mass flow controller also developed by the company.
The flow of the reactive gas is controlled to maintain the transition region between the metallic mode and reactive mode.
Advantage
Fast and highly reliable feedback control
The RU-1000 plasma emission controller with its newly developed algorithm performs fast and highly reliable feedback control. Customers can change the PID value and thus it is possible to optimize the settings for your particular conditions.
Excellent S/N characteristics with plasma emission
Optimal designs are applied using collimators and other optical parts for accurately measuring slight changes in the amount of light emitted by plasma emission.
Special user-friendly software
The special software was designed while taking customer demands to heart; it promises outstanding
operability. Customized software can also be developed according to customers’ needs.
*According to survey conducted by HORIBA STEC in 2014
Features
From plasma emission detection to gas flow, experience the latest control technologies pioneered by HORIBA STEC.
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*According to survey conducted by HORIBA STEC in 2014
Application
Condition control of the vacuum chamber
Reactive sputtering with functional films or functional substrates is performed in a continuous process for a prolonged period of time. Stable film deposition processes require real-time measurement of the
changing conditions inside the vacuum chamber and the plasma emission, as well as adequate control
of the flow rate of the reactive gas being introduced according to the degree of the changes.
Any process for depositing multi-layer films involves the need for increased control of the deposition
rate of each film according to the rolling and conveying speed.
The RU-1000 monitors voltage signals of the impedance in the plasma power supply and the intensity
of plasma emission. The feedback given to the mass flow controller based on the monitored signals
helps manufactures control the plasma emission at an optimal level and thereby enhance their productivity.
Flow controllers and plasma instruments for process optimization
An array of systems is used to measure and control the conditions inside the vacuum chamber. They ensure stable production and boost productivity by monitoring conditions inside the chamber and maintaining an optimal sputtering process.
Residual gas analyzer MICROPOLE SystemA system for measurement of traces of residual gas inside the chamber The compact MICROPOLE System, which includes a controller with excellent operability, can be easily mounted onto the coating systems you are currently using. Additional features are also available, such as connection with more than one PC at a time and software for analyzing the conditions of residual gas inside the chamber.
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Liquid material vaporizer VC SystemA system for vaporizing traces of water and liquid materials to be added to the deposition process It is believed that the functionality of functional thin films is enhanced in the deposition processes by adding traces of vaporized water (H2O) into the chamber. |
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Plasma emission analysis monitor EV-140C SystemA system for plasma emission analysis in the deposition process The CCD detector can simultaneously measure a wide range of wavelengths from 200 to 800 nm with a minimum capture time of 20 msec and maximum resolution of 2 nm. |
Manufactured by HORIBA STEC
Specifications
Main controller unit RU-1000
Input signal | Ethernet(10BASE-T,100BASE-TX) 1CH |
Output signal | PMT Gain setting signal (0-5Vdc/0-100%) 4CH |
Power supply | AC100~240V±10% 50/60Hz 100VA |
Weight | Approx. 5.3kg |
PMT unit RU-1000P
Input signal | Plasma emission, PMT gain(0-5V) |
Output signal | PMT output signal (0-10Vdc) |
Power supply | DC15V 60mA |
Other | A narrowband filter can be attached with the inside of PMT. |
Weight | Approx. 720g |
Collimator RU-1000C-01/02
A category temperature range and the humidity range. | 10-300℃, 10-80%RH |
Material | Collimator : SUS304 Window lens : synthetic fused silica glass |
Weight | Approx. 150g |
The diameter of a collimator tip | φ12 |
Flange for PMT unit RU-1000F-01/02
A category temperature range and the humidity range. | 10-200℃, 10-80%RH |
Weight | Normal Type : Approx. 100g |
Cable RU-1000H
Name | Type |
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Narrowband filter Set | RU-1000B |
Cable for SIG (1M) | RU-1000H-02-01 |
Cable for SIG (2M) | RU-1000H-02-02 |
Cable for SIG (3M) | RU-1000H-02-03 |
Cable for SIG (5M) | RU-1000H-02-05 |
Cable for SIG (10M) | RU-1000H-02-10 |
Name | Type |
---|---|
Cable for PMT(1M) | RU-1000H-01-01 |
Cable for PMT(2M) | RU-1000H-01-02 |
Cable for PMT(3M) | RU-1000H-01-03 |
Cable for PMT(5M) | RU-1000H-01-05 |
Cable for PMT(10M) | RU-1000H-01-10 |
Optical fiber RU-1000 O
Name | Type |
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Optical fiber for PMT(0.5M) | RU-1000O-005 |
Optical fiber for PMT(1M) | RU-1000O-010 |
Optical fiber for PMT(1.5M) | RU-1000O-015 |
Optical fiber for PMT(2M) | RU-1000O-020 |