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The HORIBA EMGA-600 is a combined model between ON and H analyzers and determines the oxygen, nitrogen and hydrogen contained in ferrous and non-ferrous metals, semiconductors, electronic materials and so on using the inert gas fusion method.
This is an oxygen and nitrogen elemental analyzer with high accuracy and repeatability suiting to cutting-edge technology's R&D as well as quality control in the market of steel, new materials, catalyst and so on. This is a new generation model optimized to fit to user's requests.
The HORIBA EMIA-V2 series determine the carbon and sulfur contained in steels, nonferrous metals, steel alloys, special metals, inorganic iron ores, etc.
The ENDA-5000 series are superior continuous analysis systems that are perfect in the difficult field of exhaust gas measurement and can monitor up to five components, thanks to HORIBA's innovative optical technology.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
High throughput compact rugged spectrograph, suitable for dedicated Raman analysis and portable applications. Available rack mounted for industrial settings.
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
- High efficiency measurement
- Measuring angles 20° and 60°
- Flexible use with its remote probe
- Range 0-100
- Cost Effective









