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Support for multi-batu, single-bath, and dingle-wafer cleaning systems
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
High throughput compact rugged spectrograph, suitable for dedicated Raman analysis and portable applications. Available rack mounted for industrial settings.
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
- High efficiency measurement
- Measuring angles 20° and 60°
- Flexible use with its remote probe
- Range 0-100
- Cost Effective
- For ultra high gloss measurement
- Dual range gloss meter
- Flexible use with its remote probe
- Measuring angle 60°
- Dual range 0-100 and 0-1000
The HP-480 industrial pH meter is a standard type pH meter that mainly includes frequently used functions.
The LA-930 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.
The LB-550, using a dynamic light scattering technique, is able to measure very concentrated suspensions, up to 40% solids in many cases, over a size range of 1nm-6µm.
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