Semiconductor

The UVISEL FUV spectroscopic ellipsometer extends the UVISEL VIS down to 190 nm.

The UVISEL ER-Extended Range spectroscopic ellipsometer covers a wide spectral range from 190 to 2100 nm.

The UVISEL VUV ellipsometer provides the best combination of superior VUV performance and experimental flexibility to determine thin film thickness and optical constants across the wavelength range 142 to 880 nm.

The use of a concave aberration corrected holographic grating simplifies the optical configuration of the H-20 monochromator in comparison to conventional monochromators.

The LA-930 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.

Real time interferometric endpoint for depth targeting.

Available as an imaging spectrograph or scanning monochromator, the new automated MicroHR allows users to make rapid and precise measurements, offering a degree of versatility not found in comparable focal length spectrometers.

The NIR MicroHR is a 140 mm focal length spectrometer featuring gold optics (for increased through-put in the NIR spectral region) and interchangeable gold gratings for optimization of optical components and wavelength range selection.

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes