Wet

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

Ideal for hydrofluoric acid monitoring in semiconductor manufacturing

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

The LA-930 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.

The IR-150 is designed for real time inline concentration measurement using a Non-dispersive infrared (NDIR) method