Wet

High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.

Ideal for ozone fluid density control in semiconductor production processes

This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices

High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.