Semiconductor Process

Material Analysis

Lithography Process

HORIBA's PR-PD2 Particle Detection System

High sensitive particle detection down to 0.35µm.

PR-PD2HR Particle detection system

Achieves dramatic cost reductions in advanced mask inspections

Compact Reticle/Mask Particle Detection System PR-PD3

Low running costs thanks to a compact design, plus remarkable versatility

PR-PD5 Particle detection system

For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.

Reticle/Mask Particle Remover RP-1

Automatically removes particles by blow and vacuum suction

DI Water Analysis (Wet Process)

Highly Sensitive Silica Monitor SLIA-300

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

Material Analysis (Particulates Analysis & Defect Analysis)

LabRAM HR Evolution Raman Microscope

High spectral resolution analytical Raman microscope for ultimate performance and flexibility; includes UV Raman configuration, full automation and wide range of accessories.

GD-Profiler

Le GD-Profiler 2™ permet l’analyse simultanée de tous les éléments y compris les gaz (azote, oxygène, chlore, hydrogène). Il est l’outil idéal pour la caractérisation des surfaces, des couches minces, des dépôts et le suivi de productions.

Chemical Analysis (Wet Process)

Fiber Optic Type Chemical Concentration Monitor CS-100F1 Series

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

Standard Clean 1 (SC-1) chemical concentration monitor image

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

Appearance of CS-152, SC-2 monitor

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices

SPM Monitor image

High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices

BHF monitor image

The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.

CS-153N HF/HNO3 Monitor

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

FPM Monitor / CS-153

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

CS Series Monitors

High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices

Hydrofluoric Acid Monitor CM-200A/210A

Ideal for hydrofluoric acid monitoring in semiconductor manufacturing

In-line type Dissolved Ozone Monitor OZ-96i

Ideal for ozone fluid density control in semiconductor production processes

 

Dissolved Ozone Monitor OZ-96

This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

 

Digital Liquid Mass Flow Meters/Controllers LF-F/LV-F series

High precision liquid mass flow controller using the sensor with a unique cooling method. Can control from micro-liter to ultra low flow rate.

2-channel Carbon Sensor Resistivity Meter HE-960RW-GC(W)

Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm

Carbon Sensor Resistivity Meter HE-960R-GC(W)

Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm

Industrial Resistivity Meter HE-480R

Compact resistivity meter for versatile porpose. Measurement range: 0 - 100.0 MΩ・cm

Low Concentration HF/HCl/NH3 Monitor HF-960M

High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.

Gas Control/Analysis (Dry Process)

Multi Range/Multi Gas Digital Mass Flow Controller SEC-Z500X Series

The best-selling digital mass flow controller offering multi range/multi gas solutions. High accuracy, fast response, and compact size. All metal.

Automatic pressure regulators

The UR series automatic pressure regulators are electronic regulators with high-precision pressure sensors and ...

Compact Baking System LSC Series

Best-selling, compact baking system suitable for a range of liquid source delivery applications. Easy maintenance.

Direct Injection System VC Series

The compact vaporization system does not require carrier gas, it can be used with either a liquid or gas flow meter, allowing for easy integration for direct liquid injection.

Liquid Auto Refill System LU Series

Automatic liquid refill system delivers chemicals directly to baking or direct liquid injection systems. Safe, efficient, and continuous supply of liquid sources.

Wafer Back Side Cooling System GR-300 Series

High stability and accuracy pressure controller for back side wafer cooling in semiconductor manufacturing, installed piezo actuator valve and pressure sensor.

Mixed Injection System Liquid Vaporizer MI-1000/MV-1000 Series

Vaporize liquid source stably by the gas-liquid mixture vaporization method. Can be used for low temperature and large flow production.

Process Monitoring (Dry Process)

Compact Process Gas Monitor MICROPOLE System

Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.

Thin Film Control/Analysis

Real Time Interferometric Process Monitor LEM-CT-670-G50

Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.

Real Time Interferometric Process Monitor DIGILEM-CPM-Xe/Halogen

Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.Interference occurs when monochromatic light hits the sample surface, resulting in...

Optical Emission Spectroscopy Etching End-point Monitor EV-140C

Emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.

UVISEL Plus

Produits : UVISEL VIS : 210-880 nm | UVISEL FUV : 190-880 nm | UVISEL NIR : 245-2100 nm | UVISEL ER : 190-2100 nm |

Idéal pour la caractérisation des couches minces en recherche et développement.

CMP Process

Particle Size Distribution Analyzer LA-920

Particle size distribution analyzers, which determine both the size of particles and their state of distribution, are used for the production control of powders in such fields as ceramics, chemistry, and foodstuffs. The LA-920,...

LA 950V2

Les granulomètres de la série LA utilisent la théorie de diffusion de Mie (diffraction laser ) pour mesurer la taille des particules de suspensions ou poudres sèches. La rapidité et la facilité de mise en oeuvre de cette technique en font la plus populaire pour nombre d’ applications.

LB550

Le granulomètre LB-550 utilise la technique de diffusion dynamique de la lumière et permet de mesurer des solutions concentrées, jusqu’à 40% en poids, sur une large gamme de 1nm à 6 microns.

Drain Water Analysis