| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Particle removal | SC-1 (APM) | CS-131 ＊ | NH3 | H2O2 | H2O |
| CS-151 | NH3 | H2O2 | H2O | ||
| CS-121F1 | NH3 | H2O2 | H2O | ||
| Alkali/H2O2 | CS-159B | Alkali | H2O2 | H2O | |
| TMAH/H2O2 | CS-139E | TMAH | H2O2 | H2O | |
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Metallic removal | SC-2 (HPM) | CS-152 | HCl | H2O2 | H2O |
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Post RCA | AM-1 | CS-131 | Shown above ＊ | ||
| MC-1/MC-1-SP | CS-131 | Shown above ＊ | |||
| Reps-203 | CS-131 | Shown above ＊ | |||
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Organic removal | SC-1 (APM) | CS-131 | Shown above ＊ | ||
| Alkali/H2O2 | CS-220B | Alkali | H2O2 | H2O | |
| TMAH/H2O2 | CS-139E | TMAH | H2O2 | H2O | |
| SPM | CS-150 ＊＊ | H2SO4 | H2O2 | H2O | |
| HCl | CS-152S | HCl | H2O | ||
| HE-960M | HCl | ||||
| H2O2 | CS-152H | H2O2 | H2O | ||
| O3 | HZ-960 | O3 | |||
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Polysilicon etching | NH3 | HF-960M | NH3 | ||
| CS-131S | NH3 | H2O | |||
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Resist removal | SPM | CS-150 | Shown above ＊＊ | ||
| CLK-888 | CS-139K | XXXX | H2O2 | Others | |
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
BSG removal | H2SO4/HF | CS-133V | H2SO4 | HF | H2O |
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Oxide removal | BHF | CS-137 | NH4F | HF | H2O |
| FPM | CS-153 | HF | H2O2 | H2O | |
| DHF | CS-133U-O2P2 | HF | H2SiF6 | H2O | |
| CS-133U-1002 | HF | H2SiF6 | H2O | ||
| CM-210 | HF | ||||
| HF-960M | HF | ||||
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Oxide/Ni etching | HF/Ethylene glycol | CS-138 | HF | H2O | EG |
| CS-138W | HF | EG | H2O | ||
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Al etching | HNO3/CH3COOH/H3PO4 | CS-139J | HNO3 | CH3COOH | H3PO4 |
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Polymer removal | HNO3/HF | CS-153N | HNO3 | HF | H2O |
| H2O/Amine | CS-135B | H2O | A.B.F | AMINE | |
| H2O/Other | CS-135D | H2O | Others | ||
| EF-1 | CS-135E | HF | H3PO4 | Others | |
| ALKALI | CS-139R | ALKALI | H2O2 | Others | |
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Low-K etching | LK-1 | CS-135A | H2O | XXX | |
| PROCESS | CHEMICAL | Model | Measurement Object | ||
|---|---|---|---|---|---|
Others | HNO3/HCl | CS-152N | HNO3 | HCl | H2O |
| HF/HCl | CS-133A-12 | HF | HCl | H2O | |
| CS-133A-15 | HF | HCl | H2O | ||
| CS-133A-55 | HF | HCl | H2O | ||
| TMAH | CS-139ES | TMAH | H2O | ||
| HE-960H-TM | TMAH | ||||
注記：１．各モデルの詳細仕様およびその他の薬種・レンジに関しましては、お問い合わせください。 ２．各モデルの光ファイバ式モデルもご用意しています。