Fiber Optic Type Chemical Concentration Monitor CS-100F1 Series

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

HORIBA's PR-PD2 Particle Detection System

High sensitive particle detection down to 0.35┬Ám.

Compact Reticle/Mask Particle Detection System PR-PD3

Low running costs thanks to a compact design, plus remarkable versatility

PR-PD5 Particle detection system

For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.

PR-PD2HR Particle detection system

Achieves dramatic cost reductions in advanced mask inspections

BHF monitor image

The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.

UVISEL Plus

Products: UVISEL Plus: 190-920 nm | NIR Option: 2100 nm

Measure thin film thickness and optical constants. The reference ellipsometer for research and process development.

CS Series Monitors

High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices

SPM Monitor image

High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices

Appearance of CS-152, SC-2 monitor

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices