|Applicable case||Nikon/Canon/SMIF POD/HORIBA|
|Throughput||Simultaneously blows the glass and pellicle surfaces to remove particles approximately for 1 min.|
|Dimensions||1190(D) x 1150(W) x 1520(H)mm|
Reticle/Mask Particle Remover
The RP-1 automatically removes particles from the reticle/mask by air (or N2) and vacuum suction. Routinely removing the particles before the lithography process extends the replacement cycle of the pellicle and cleaning cycle of the mask, thereby contributing to a reduction in running costs.
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