Semiconductor Page Heading

Thin Film Analysis

Thin Film characterization are important in the development phase of new materials to minimize the time to market of a new generation of devices and in the metrology step, which is required for improving the yield of a production line for minimizing wafer-to-wafer variation. HORIBA a leader in optical spectroscopy from deep UV to XRF offers a unique range of high-end tools for Materials and Thin Film Analysis which can used in R&DIn-Line or integrated in a process chamber.

Key Benefits:

  • Single sensor or multiple sensor platform
  • For 4”,6”, 8” and 12 “ wafer size
  • Fast measurement
  • Modular and easy customization for OEM integration
  • Global Application support.

Related Products

UVISEL Plus
UVISEL Plus

Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm

UVISEL Plus In-Situ
UVISEL Plus In-Situ

In-situ spectroscopic ellipsometer for real-time thin film monitoring

Auto SE
Auto SE

Spectroscopic Ellipsometer for Simple Thin Film Measurement

XploRA Nano
XploRA Nano

AFM-Raman for Physical and Chemical imaging

LabRAM Odyssey Nano
LabRAM Odyssey Nano

AFM-Raman for physical and chemical imaging

LEM Series
LEM Series

Camera Endpoint Monitor based on Real Time Laser Interferometry

Požadavek na informaci

Máte nějaké dotazy nebo požadavky? Pomocí tohoto formuláře kontaktujte naše specialisty.

* Tato pole jsou povinná.

Corporate