Nonmetallic Minerals

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GDOES, the Analytical Companion Tool for Magnetron Sputtering Deposition
Magnetron sputtering
Pulsed RF GDOES is a companion analytical tool for magnetron sputtering deposition. Magnetron sputtering is a type of Plasma Vapour Deposition. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage (RF, HIPIMS etc), a glow discharge is created, resulting in acceleration of ions to the target surface and a plasma coating. The argon-ions will eject sputtering materials from the target surface (sputtering), resulting in a sputtered coating layer on the products in front of the target.
Luminescence of Glasses Doped with Rare Earths for Photonic Materials
HORIBA Spectrometers are used to characterize doped glasses for photonics
Plasma Emission Control and Process Gas Monitoring for Dry Coating Process in Functional Glass Manufacturing
Functional Glass
Analytical Chemistry in Nonmetallic Minerals

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