Plasma monitors are required during the manufacturing processes when plasma is used.
Plasma monitors are used to monitor plasma emissions during the semiconductor manufacturing process, for example, etching and sputtering.
HORIBA offer two in-situ real time plasma monitors for the plasma process:
Endpoint / Chamber Health Monitor based on Optical Emission Spectroscopy and MWL Interferometry
Multispectra, Multifiber, Multichannel Imaging spectrometer with 8-16-32 Simultaneous UV-NIR Spectra
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