Combination of a powerful Glow Discharge source with Ultra-Fast High Resolution simultaneous optics for fast Elemental Depth Profile Analysis of conductive, non-conductive and hybrid materials.
For thin & thick films – from nanometre to hundreds of microns with nanometer depth resolution.
Typical domains of applications include PV, metallurgy, LED manufacturing, corrosion studies, organic and micro-electronics, materials research & development, deposition processes optimisation, PVD, CVD, plasma coatings, automotive, Li batteries, etc
No UHV required.
Measurement of all elements of interest (including H, D, O, Li, Na, C, N etc) with patented High Dynamic Detectors.
Optional monochromator with Image mode and high Dynamic detection for full spectrum record and total flexibility.
Pulsed RF Source for operation in RF and pulsed RF modes with auto-matching
Differential double pumping of the source for patented SEM sample preparation
Plasma Cleaning function built in
Patented UFS for Ultra-Fast Sputtering of polymeric and organic materials
Patented DIP – built in interferometer for direct on line depth measurement
Various anode diameters and accessories for odd shape samples
Windows 10 software – Multiple copies provided for remote installations
