Optical Emission Spectroscopy

          Optical Emission Spectroscopy (OES) is a very flexible method which measure the amplitude or amplitude-ratio changes of particular emission lines emitted by a plasma. Because it is a rich real-time source of information for plasma etch and deposition monitoring, OES has been used for years by the Semiconductor industry. In addition to Endpoint monitoring, OES is used for detailed diagnostics such as tool fluctuations, tool-to-tool variations, and tool/ process variations after routine chamber maintenance or repair by means of plasma process-spectra matching.
          Depending on the application, HORIBA offer a wide range of OES spectrometer and Advanced Process Control solution package to meet the needs of the final end-user or tool manufacturer.

 

	VS70	EV2.0	EV-140C	OES-Star	M116	VU90
Spectral range	200-910nm	200-1050nm	200-800nm	200-1050nm	185-1050nm	115-320nm
Resolution	< 2 nm	< 2 nm	< 2 nm	< 1 nm	< 1.3 nm	< 0.75 nm
Optical Coupling to the chamber	Optical Fiber	DN25 Flange or Optical Fiber	Optical Fiber	Optical Fiber	Optical Fiber	Direct
Communication with the tool	Ethernet EtherCAD USB	TCPIP	TCPIP	USB	USB	USB
Software	LabView	SigmaP	SigmaP	LabView	LabView	LabView