APSA-370/CU-1

Ambient Hydrogen Sulfide Monitor

APSA-370/CU-1 Ambient H2S monitor measures SO2 converted H2S through oxidation catalyst based on Ultra Violet Fluorescence. In order to reduce measurement error by water concentration fluctuatin in ambient, humidifier is set at sample line. It enables long-term stability according to stabilizing catalytic reaction.

Oddělení: Ambient
Výrobní společnost: HORIBA, Ltd.
Base product: AP-370 Series

Measurement component 

Hydrogen sulfide (H2S) 
Measurement principleOxidation catalyst + Ultra Violet Fluorescence
Measurement range0-0.1/0.2/0.5/1.0 ppm
Lower detectable limit2 ppb
Repeatability±3.0% of F.S.
Linearity±2.0% of F.S.
Zero drift±2% of F.S./day
Span drift±5% of F.S./day
Response time (T90)180 sec. or less (from CU-1converter unit)
Sample gas flow rateapprox. 0.7L/min
Operation gasNone
IndicationMeasuring value, alarm
AlarmAPSA-370: Calibration error, Battery error, Flow rate error, Pressure error, Temperature error in catalyzer, etc.
CU-1: Temperature error in catalyzer
Inpt/Output0-1V/0-10V/4-20mA (2 systems: either (1) momentary value and integrated of (2) moving average value)
Contact input/output
RS-232C (option)
Temperature/Humidity0-40°C / 85% or less
Power100/110/115/120/220/230/240 VAC, 50/60Hz
Power consumptionAPSA-370: 150VA
CU-1: 150VA
DimensionAPSA-370: 430(W) x 550(D) x 221(H) mm
CU-1: 430(W) x 550(D) x 221(H) mm
MassAPSA-370: approx. 19kg
CU-1: approx. 10kg
Real-Time Gas Measurement in Fuel Cells for Household and Commercial Use
Real-Time Gas Measurement in Fuel Cells for Household and Commercial Use
Monitoring of Airborne Molecular Contamination in Clean Room of Electronics Industry
Monitoring of Airborne Molecular Contamination in Clean Room of Electronics Industry
Continuous Monitoring of Sulfide Off-Flavors in Beverage Production
Continuous Monitoring of Sulfide Off-Flavors in Beverage Production
Monitoring of Hydrogen Sulfide Airborne Molecular Contamination in Semiconductor Fabrication
Monitoring of Hydrogen Sulfide Airborne Molecular Contamination in Semiconductor Fabrication

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