Low Concentration Type HF/HCl/NH3 Concentration Monitor HF-960M

Vue d'ensemble

The HF-960M uses sensors that offer outstanding corrosion resistance for high-precision, high-speed measurement of low concentrations of hydrofluoric acid, hydrochloric acid and ammonia, and is thus perfect for single-bath and wafer cleaning. The HF-960M is also an environmentally-friendly product that uses lead-free solder for mounting chips on the PCB.


  • Precise measurement of low HF concentrations
  • 5 types of measurement available
    HF, HCl & NH3 concentrations, conductivity, and temperature
  • The analog output range can be arbitrarily set with to the concentration measuring range
  • The HF-960M provides 7 output points
  • 3-channel transmission output
  • RoHS compliant
  • DC 24 V Power Source
  • CE Marking compliant

Fabriqué par HORIBA Advanced Techno


Product name

Low Concentration Type HF / HCl / NH3 Concentration Monitor



Measurement range

HF: 0 - 5000 ppm, HCl: 0 - 5000 ppm, NH3: 0 - 10000 ppm, Conductivity:0 - 50.0 mS/cm

Power supply

Rated voltage 24 V DC, 10 W (max)


Iindoor-use, panel installation type, panel case : ABS, terminal : PBT, Panel : IP65 dust and water proof structure

External dimensions

96 (W) x 96 (H) x 115 (D) mm, Case depth : approx.105 (when panel-mounted)


Approx. 550 g

Conforming standards

CE marking, FCC Part15

Compatible sensors

FS-10F series flow-type sensor


Dimensions of HF-960M


  • Technical Article

Conductivity Meter with Carbon Electrodes and Application for Densitometers Technologies for a Practical Densitometer (1.8MB)

"2-pole electrical conductivity sensors with chemical resistant carbon electrodes are developed in 2002. These sensors are installed in the semiconductor wet process and used as a densitometer practically. The electrical circuit for 4-pole measurement was an innovation which improved the interface problem to the any 4-pole sensors. Single component concentration of HF or TMAH is measured from the conductivity, based on the precise measurement of conductivity and temperature, via individual temperature compensation of conductivity. Etching or developing solution should be controlled severely. Needs for monitoring solution based on the application of conductivity method are increased."

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