Materials Analysis

HORIBA's instruments can detect and analyse particles on photomask. For organic and polymer materials, RAMAN is used to analyze the detected foreign particles on a mask such as nylon, hair and cosmetic. For metal materials,XGT-9000 is used to analyze the detected foregin particles on a mask such as Ni, Al and Cr.

Ellipsometry is used to monitor thickness and optical constant (Réflective index (n) and Extinction Coefficient (k)) of pellicle on photomask.

Pellicle Thickness Analysis

Evaluates the thickness uniformity of the next generation pellicle.

Particle Object Identification

Useful for investgating problems by analyzing foreign matter components on the reticle.

Related Products

PD Xpadion
PD Xpadion

Reticle / Mask Particle Detection System

UVISEL Plus
UVISEL Plus

Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm

UVISEL Plus In-Situ
UVISEL Plus In-Situ

In-situ spectroscopic ellipsometer for real-time thin film monitoring

GD-Profiler 2™
GD-Profiler 2™

Discover a Whole New World of Information with Glow Discharge Optical Emission Spectrometer

XploRA Nano
XploRA Nano

AFM-Raman for Physical and Chemical imaging

MicOS
MicOS

Photoluminescence Microspectrometer

XGT-9000
XGT-9000

X-ray Analytical Microscope (Micro-XRF)

XGT-9000SL
XGT-9000SL

X-ray Analytical Microscope
with a Super Large Chamber

SMS
SMS

Add Spectroscopy to ANY Microscope

Cathodoluminescence - CLUE Series
Cathodoluminescence - CLUE Series

Cathodoluminescence Solutions for Electron Microscopy

Partica CENTRIFUGE
Partica CENTRIFUGE

Centrifugal Nanoparticle Analyzer

Request for Information

Do you have any questions or requests? Use this form to contact our specialists.

* These fields are mandatory.

Corporate