Chemical Concentration Monitoring
HORIBA provide a wide range of inline and offline concentration monitors for the different high and low concentration wet etching processes for Low-k, Al, Oxide/Nitride, Poly Silicon etc. In addition to monitors for wet etching a wide range of monitors for the different cleaning steps, for example removal of particles, resist, metallic layer, organic layers, oxides, polymers etc are also available.
To assist selection of the correct monitor for you chemistry please view our Chemical Solution Monitor *1 brochure.
*1 This will open in a new window
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
TMAH/H2O2 Monitor, CS-139E - High-speed response and compact chemical solution concentration monitor
High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.
Measurement range: 0 -10%