Can a single characterization platform reveal both optical behavior and wafer-scale uniformity?
In this application note, the HORIBA UVISEL Plus spectroscopic ellipsometer is used to characterize an epitaxial Cr₂O₃ thin film grown on sapphire. By combining advanced multilayer modeling, birefringence analysis, Tauc–Lorentz dispersion fitting, and automated XY-stage mapping, the system delivers a complete understanding of film quality.
Film thickness, roughness, optical constants, and optical band gap are accurately determined, while spatial mapping reveals center-to-edge variations and process reproducibility across the sample surface. This study demonstrates how UVISEL Plus transforms ellipsometric measurements into actionable insight, enabling researchers and engineers to optimize advanced optical coatings with confidence.
Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm
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