HZ-960HPO-M

H2O2 Monitor

A concentration monitor for hydrogen peroxide solutions used in the cleaning processes of semiconductors and solar cells to remove particles and metal ion impurities.

Capable of highly accurate measurements of hydrogen peroxide solution concentrations with a minimum resolution of 1 ppm, making it suitable for low-concentration chemical treatment.

Segment: Semiconductor

Division: Wet Process Control

Manufacturing Company: HORIBA Advanced Techno Co., Ltd.

Abundance of measurement options
In addition to the standard measurement range of 0–1 mass% for hydrogen peroxide, there are three additional measurement ranges available. Recommendations for the optimal range will be provided.

Choice of pipe sizes
In addition to the standard 3/4-inch size, 1/2-inch and 1-inch sizes can be chosen.

High reproducibility and stability accuracy are ensured.
The reproducibility accuracy is within FS+/- 0.2%.

Specifications of HZ-960HPO-M
Corresponding detector	ZH-10HPO	ZH-40HPO	ZH-100HPO	ZH-500HPO
Measurement range	0 - 1000 ppm	0 - 4000 ppm	0 - 1%	0 - 5%
Supply temperature	5 - 30 deg.C			5 - 80 deg.C
Chemical contact material of detector	PFA, PTFE, quartz glass
Supply pressure	Within 0.5 MPa
Repeatability	+/- 0.2% of full scale
Linearity	+/- 1.0% of full scale
Transmission output	Number of output: 2
Contact input	Number of output: 5
Communication output	RS-485
Power supply	Rated voltage 24 +/- 10% V DC, 15W