A Residual Gas Analyzer for Dry Etching Process

By: Makoto MATSUHAMA

30 January 2018


Figure 1 (a) RGA set up (b) The heating temperature in the system

Author Information: Advanced R&D Center, HORIBA, Ltd.

Abstruct: Concerning the dry process of the semiconductor device manufacturing, the monitoring of etching chamber conditions (pressure, temperature, gas concentration, ...) is crucial. This time, as a study of a new application, we examined the etching chamber management by using the residual gas analyzer. Generally using a residual gas analyzer in a dry etching apparatus which uses halogen-containing gas has been being avoided because of concerns such as sensors life. By confirming the residual gas component in the chamber before etching, it was possible to illuminate the cleaning process.

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