Measurement and Monitoring of Processing Plasmas

By: Masaharu SHIRATANI*

11 April 2019


Figure 5 Spatial distribution of volume fraction of nanoparticles in thin films deposited by plasma CVD.

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Author(*) Information: Director, Graduate School and Faculty of Information Science and Electrical Engineering,Kyushu University,Doctor of Engineering

This article describes measurements and monitoring of density of radicals and size and density of nanoparticles, which are important internal parameters in plasma processes. The radical measurements give valuable information on density of predominant deposition precursors and their surface reaction probability. It is difficult to apply the measurement methods to production lines. On the other hand, a simple measurement method is available for the spatial profiles of size and density of nanoparticles. Development and applications of novel monitoring methods are needed to realize control of plasma processes.

Note: Full paper of the same content in Japanese is in Readout No.51Japanese edition.