Quantitative Analysis of Oxygen in Silicon Wafers

The concentration of oxygen in silicon wafers has a significant impact on their electrical resistance. Therefore, it is crucial to control the concentration of oxygen, even in extremely small amounts, in silicon wafers. However, a challenge arises when analyzing highly doped single crystals. Due to their unique properties and high doping levels, the analysis of oxygen in these samples becomes more difficult. The presence of impurities and dopants can interfere with the accurate measurement of oxygen concentration using FT-IR spectroscopy.