Gas Concentration Monitor
High senility in-line gas monitor of SiF4 and CF4 for chamber cleaning end point monitoring in deposition process. Reduce clean time and gas usage by real-time monitoring.
In-line compact vapor concentration monitor, enables MOCVD precursor delivery to be stable.
Monitors SiF4 gas concentration in real time, and identifies the cleaning end-point based on SiF4 gas concentrations.