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D700 MG Brochure
D700MG
High Speed & Precision Pressure Insensitive Mass Flow Module
Critical semiconductor manufacturing process continuously desires precision gas flow control device that enable both future innovation and lab to fab transition of leading edge memory and logic device. HORIBA newly propose pressure based MFC D700MG as upper compatible model of D500MG to support customer’s challenges.
Segment: Semiconductor
Division: Fluid Control
Manufacturing Company: HORIBA STEC, Co., Ltd.
Selection of countries and territories where this product is available:
China,Germany,Ireland,Israel,Italy,Japan,Korea (South),Malaysia,Singapore,Taiwan,United Kingdom,United States
View the complete list
here.
On-Tool Gas and Full Scale Configuration Change *Only EtherCAT
Provide flexibility to process optimization
100ms Step-up Response & MFC-to-MFC deviation control
Deliver high productivity and greater process performance
MRMG functionality for small flow rate(Bin101 – Bin105)
Provide flexibility to process requiring small flow rate
Better Valve Shut-off and Corrosion Resistance by PFA nozzle
Robustness with less particle risk reduce down time and optimize yield
State Monitor Function
Provide more internal data for smarter failure prediction
Output items of state monitor function |
Flow/Pressure zero adjustment counts |
Valve drive counts |
Record of max/min P0,P1,P2 pressure |
Record of max/min Block temperature |
Total time over/below pressure spec. |
Total time over/below temperature spec. |
Total working time |
Total control time |
Total flow time (per calibration instance) |
Total flow rate (per calibration instance) |
*1 Flow rate accuracy is traceable only down to 2 SCCM, hence actual gas accuracy not guaranteed below 2 SCCM.
*2 This is guaranteed value under 25 ℃ and ≤ 1.0 × 10-3 Pa (A).
*3 Setting time is MFC output signal and N2 gas. Other detail definition follows setting time of "SEMI Standard E17-1011 Section 4.1.4".
*4 Pressure perturbation has to be smaller than 20 % pressure change per second and ±70 kPa/sec (±10 PSI/sec).
*5 EtherCAT® is a registered trademark and patented technology, licensed by Beckhoff Automation GmbH in Germany.
*1 Flow rate accuracy and repeatability of Bin#14-15 are guaranteed only for N2 calibration gas.
*2 This is guaranteed value under 25 ℃ and ≤ 1.0 × 10-3 Pa (A).
*3 Setting time is MFC output signal and N2 gas. Other detail definition follows setting time of "SEMI Standard E17-1011 Section 4.1.4".
*4 Pressure perturbation has to be smaller than 20 % pressure change per second and ±70 kPa/sec (±10 PSI/sec).
*5 EtherCAT® is a registered trademark and patented technology, licensed by Beckhoff Automation GmbH in Germany.
