MV-2000 Series High Efficiency Mixed Injection

By: Ichiro NISHIKAWA

3 January 2016


Recent semiconductor manufacturing processes are designed not only to miniaturize the device structure, but also to accommodate newly developed materials and to improve the productivity, with further consideration of increasing the wafer diameter to 450 mm. In conjunction with these trends, liquid materials used in semiconductor manufacturing are further diversified and processed in a larger flow volume. Market demand for vaporizers includes vaporization of a large flow volume, lower temperature vaporization, and reduction in the carrier gas flow used. This paper provides an introduction to a high efficiency mixed injection system, the MV-2000, with significantly improved vaporization performance compared to existing products to meet market needs.

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