Pressure-Based Mass Flow Control Module CRITERION D507 Series

By: Kentaro NAGAI

30 January 2018


Figure 1 D507 Appearance

Author Information: Development Design Dept. 1, HORIBA STEC, Co., Ltd.

Abstruct: Recently, with the increase of IoT applications for semiconductor devices, it is important to minimize process system downtime at front-edge device factories. Therefore parameters are increasing and criteria are tightening in their process line control, to detect system or component failures before their process execution. In order to satisfy these criteria, not only higher process gas flow control accuracy, minimal instrumental error, and pressure resistant flow control, but also high speed control communication and early anomaly detection are required for recent mass flow control modules. D507 series is newly lined up on D500 series to meet these strict specifications at recent semiconductor factories.

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