Vapor Concentration Control System for Bubbling Method

By: Masakazu MINAMI

24 November 2013


For the semiconductor manufacturing process that involves the liquid and solid precursors, a stable and reliable vapor delivery system is usually a critical portion to the success of the process. Moreover, it could offer the capability of monitor and control the vapor concentration for bubbling method, in addition to the vaporization. This paper introduces a new Vapor Concentration Control (VCC) system that combines the bubbling vaporization technology and vapor concentration control capabilities to achieve an intelligent solution in utilizing liquid and solid precursors.

Download PDF (1.7 MB)