Semiconductor Page Heading

Plasma Monitor and Controller

HORIBA has more than 30 years’ experience providing robust and high performance solutions for monitoring and controlling high tech manufacturing processes.

 

Plasma Monitor

Plasma monitors are required during the manufacturing processes when plasma is used.
Plasma monitors are used to monitor plasma emissions during the semiconductor manufacturing process, for example, etching and sputtering.

HORIBA offer two in-situ real time plasma monitors for the plasma process:

  • The Optical Emission Spectroscopy Etching End-point Monitor can accurately and repeatably signal the end-point of plasma etching.
  •  The Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching and coating process as well as the etching and deposition rate.

Related Products

EV 2.0 Series
mehr EV 2.0 Series

Endpoint / Chamber Health Monitor based on Optical Emission Spectroscopy and MWL Interferometry

EV-140C
mehr EV-140C

Optical Emission Spectroscopy Etching End-point Monitor

RU-1000
mehr RU-1000

Plasma Emission Controller

Informationsanfrage

Sie haben Fragen oder Wünsche? Nutzen Sie dieses Formular, um mit unseren Spezialisten in Kontakt zu treten.