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GDOES, the Analytical Companion Tool for Magnetron Sputtering Deposition
Magnetron sputtering
Pulsed RF GDOES is a companion analytical tool for magnetron sputtering deposition. Magnetron sputtering is a type of Plasma Vapour Deposition. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage (RF, HIPIMS etc), a glow discharge is created, resulting in acceleration of ions to the target surface and a plasma coating. The argon-ions will eject sputtering materials from the target surface (sputtering), resulting in a sputtered coating layer on the products in front of the target.